掺杂氧化钒薄膜的制备及其热光特性  

Fabrication and Thermal-optical Properties of Vanadium Oxide Films

作　　者：杨爱国[1] 杨子健[1] 杨建红[1] 冯浩[2] 李冠斌[2] 崔敬忠[2] 

机构地区：[1]兰州大学物理学院,甘肃兰州730000 [2]兰州物理研究所,甘肃兰州730000

出　　处：《半导体光电》2008年第2期200-202,207,共4页Semiconductor Optoelectronics

基　　金：部级基金项目

摘　　要：以石英片为基底材料,采用直流/射频磁控共溅射方法制备了掺Al和掺Ti的氧化钒薄膜,重点探索了用这种方法制备掺杂氧化钒薄膜的工艺条件,对所制备的氧化钒薄膜进行了热光性能测试,并利用能带理论对测试结果进行分析。实验及测试结果表明,在氧化钒薄膜中掺入Ti杂质与掺入Al杂质相比,对薄膜的热光性质的改变所起的作用更为明显。增大Ti杂质的含量对薄膜的电阻-温度特性、相变温度,以及相变滞豫区的改善比较明显,但提高了薄膜的相变温度,而掺Al引起的变化规律与此相反。Ti-and Al-doped vanadium oxide films were deposited using magnetron cosputtering techniques on quartz substrates. The technical aspects for preparing the films were investigated, with emphasis on the optimization of deposition conditions such as pressure and temperature. Measurements were performed on the thermal and optical properties of the films including resistance-temperature dependence and transmittance-wavelength dependence. The measurement results are discussed and analyzed.

关 键 词：氧化钒薄膜 磁控溅射 掺钛 掺铝 

分 类 号：TN305.92[电子电信—物理电子学]