离子注入法形成的LiTaO_3平板光波导的特性分析  

Properties Analysis of Ion Implanted Planar Optical Waveguide in LiTaO 3

作　　者：孟鸣岐[1,2] 卢菲 王克明[1,2] 刘向东 沈定予[1,2] 王雪梅 

机构地区：[1]山东大学物理系 [2]北京大学重离子物理研究所

出　　处：《光学学报》1997年第12期1709-1712,共4页Acta Optica Sinica

基　　金：国家自然科学基金;北京大学重离子物理开放实验室基金;北京中关村地区分析测试基金

摘　　要：用能量为２．８ＭｅＶ、剂量为１．４×１０１６ｉｏｎ／ｃｍ２的Ｈｅ＋在室温（３００Ｋ）下注入到晶体材料ＬｉＴａＯ３中，形成了离子注入平板光波导。用棱镜耦合法观察和测量了ＬｉＴａＯ３波导导模的分布，并对退火前后的ＬｉＴａＯ３波导的折射率分布进行了计算和比较。利用背散射／沟道技术分析了由于Ｈｅ＋的注入而引起的波导表面的损伤。The ion implanted planar optical waveguide in crystal LiTaO 3 was formed by implantation of He + at an energy of 2.8 MeV and with a dose of 1.4×10 16 ion/cm 2 at 300 K. The modes were observed and measured by prism coupling method. The refractive index profiles of the waveguide were calculated and compared before and after annealing. The damages on the crystal surface caused by the implantation of He + were firstly investigated by using RBS/channeling technique.

关 键 词：离子注入 光波导 折射率 背散射 钛酸锂晶体 

分 类 号：TN252[电子电信—物理电子学]