列阵均匀照明系统的优化设计  

OPTIMIZATION DESIGN OF THE OPTICAL ARRAY UNIFORM ILLUMINATION SYSTEMS

作　　者：丘悦[1] 邓锡铭[1] 

机构地区：[1]中国科学院上海光学精密机械研究所

出　　处：《强激光与粒子束》1997年第4期507-510,共4页High Power Laser and Particle Beams

基　　金：国家863惯性约束核聚变领域资助

摘　　要：结合理论分析和神光系列装置均匀照明系统的设计和实验经验，从光的衍射、干涉与光束质量等角度分析了由透镜或衍射光学元件组成的列阵大焦斑均匀照明系统参数与靶面焦斑强度分布的关系，提出了列阵系统的优化设计方法。Combining with theoretical analysis and the experiences of the designs and experiments of the uniform illumination systems of SHEN-GUANG serial facilities, the optical array uniform illumination systems consisted with lenses or diffractive optics elements were analyzed in the points of views of diffraction, interference and laser beam qualities. The optical array uniform illumination systems' optimization design methods were suggested.

关 键 词：列阵光学系统 靶面均匀照明 ICF 优化设计 

分 类 号：TL632.1[核科学技术—核技术及应用] TN241[电子电信—物理电子学]