等离子体质谱(ICP-MS)测定高纯氧化镱中痕量稀土和非稀土杂质研究  

Determination of Trace Rare Earth and Non rare Earth Impurities in High Purity Ytterbium Oxide by ICP MS

作　　者：蔡绍勤[1] 张楠[1] 刘湘生[1] 安平[1] 

机构地区：[1]北京有色金属研究总院

出　　处：《分析科学学报》1997年第2期97-101,共5页Journal of Analytical Science

摘　　要：本文报道ＩＣＰ－ＭＳ直接测定高纯（５Ｎ～６Ｎ）氧化镱中稀土和非稀土杂质的新方法．对ＩＣＰ－ＭＳ测定中的光谱干扰和基体效应进行了详细考察，结果表明：用镓作内标，可有效地补偿因氧化镱引起的基体效应．方法的检出限在０．０Ｘ－０．Ｘｎｇ／ｍＬ范围；相对标准偏差（ＲＳＤ）（ｎ＝７）＜１０％．已应用于高纯氧化镱的工艺流程及其产品分析．A method for the determination of trace amounts of rare earth and non-rare earth impurities in high purity Yb 2O 3 by ICP-MS has been reported. Experimental parameters which affect analytical results were discussed in detail. Ga as an internal stanard was selected pioneerly to compensate for matrix suppression effect and sensitivity drift. The detection limits are 0.014￣0.085ng/mL and 0.05￣0.14ng/mL for rare earth and nonrare earth elements, respectively. The recoveries in the range of 88￣104% with RSD of 1.2￣8.3% were obtained.

关 键 词：ICP MS 氧化镱 稀土 杂质 内标 高纯氧化镱 

分 类 号：O614.33[理学—无机化学]