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机构地区:[1]大连轻工业学院玻璃及无机新材料研究所 [2]吉林大学
出 处:《硅酸盐通报》1997年第6期16-18,共3页Bulletin of the Chinese Ceramic Society
基 金:吉林大学无机水热合成开放研究实验室的资助
摘 要:本文在Li2O-La2O3-Ta2O5-SiO2系统电极玻璃中注入50keV,剂量分别为5×106、1×1017、2×1017ions/cm2的Ta+离子,测定了注入前后电导率、Tk-100的变化,计算了活化能。结果表明,Ta+离子注入后,随剂量的增加,电导率和Tk-100增加,活化能降低。并探讨了注入后电导率和Tk-100变化的机理。The samples of Li 2O-La 2O 3-Ta 2O 5-SiO 2 glass were implanted with tantalum ions at fluences of 5×10 16 、1×10 17 and 2×10 17 ions/cm 2 by using 50 keV MEVVA Ⅳ implanting machine. The electric conductivity of implanted and unimplanted samples were measured by LCR conduction apparatus. After implantation the activation energy of ionic conduction tended to decrease and the value of activation energy correlated with implanting fluence. The electric conductivity of implanted samples was higher than that of unimplanted samples. It was also showed that the characteristic temperature of conduction T k-100 of implanted samples decreased slightly with increasing fluences. The mechanism of conduction for implanted glass was also discussed.
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