硅基底上图形化自组装膜的构筑  

Fabrication of Patterned Self-Assembled Monolayers on Silicon Substrate

作　　者：彭倚天[1] 胡元中[1] 王慧[1] 

机构地区：[1]清华大学摩擦学国家重点实验室,北京100084

出　　处：《高分子材料科学与工程》2008年第4期136-138,共3页Polymer Materials Science & Engineering

基　　金：国家重点基础研究发展计划项目(2003CB716201);国家自然科学基金资助项目(50390060)

摘　　要：为在硅基底上得到不同化学基团修饰的图形,采用传统的光刻技术与自组装相结合的方法,成功地制备了由甲基与氨基末端官能团组成的图形化自组装膜。将图形化自组装膜泡入碳纳米管DMF(N,N-二甲基甲酰胺)分散液中,图形化自组装膜的氨基区域能均匀吸附一层分散液中碳纳米管,而甲基没有,表明图形化自组装膜的不同自组装膜区域的不同表面性质,证实了该方法的可行性。Patterned self-assembled monolayers（SAMs） terminated with amine and methyl groups were fabricated using photolithography and self-assembled technique. The deposition of carbon nanotube is conducted by immerging the patterned self-assembled monolayers into the DMF solution with suspended carbon nanotubes. SEM images showed that carbon nanotubes deposit exclusively on the area with amino-terminated self-assembled monolayer, which confirms the difference in surface property on different regions of the patterned SAMS.

关 键 词：多壁碳纳米管 自组装单层膜(SAMS) 图形化 光刻 

分 类 号：TB383[一般工业技术—材料科学与工程]