Pr层厚度对纳米级Fe/Pr/Cu多层膜巨磁阻的影响  

The Effect of Annealing Temperature on GMR in Fe/Pr/Cu Multilayer Films

作　　者：韩庆艳[1] 成钢[1] 顾正飞[1] 

机构地区：[1]桂林电子科技大学信息材料科学与工程系,广西桂林541004

出　　处：《电工材料》2008年第2期23-26,共4页Electrical Engineering Materials

基　　金：广西自然科学基金项目(桂科基0575093)

摘　　要：采用直流磁控溅射法制备Fe/Pr/Cu系列多层膜,在超高真空中进行热处理,测量了系列样品的结构和磁电阻。结果表明:退火温度为275℃的薄膜样品具有较好的层状结构和周期性。多层膜的层间耦合性质随Pr层的厚度增加而发生变化,巨磁电阻(GMR)效应随Pr层的厚度增加而减小。讨论了稀土Pr及Pr层的厚度对巨磁电阻效应的影响。The Fe/Pr/Cu multilayer films deposited onto substrates with a magnetron controlled sputtering method and then did in the ultra-high vacuum heat treatment, also did a series of sample measurements of the structure and magnetoresistance. The results show that： the film samples have better layered structure and cyclical at the annealing temperature of 275℃. The multi-layer film changed by the increase of the Pr coupled thickness, the giant magnetoresistance decreases by the increase of the Pr layer thickness. Descuess the effect of Pr and Pr layer thickness on the giant magneto resistance.

关 键 词：Fe/Pr/Cu多层膜 Pr厚度 巨磁阻(GMR)效应 磁控溅射 

分 类 号：TM27[一般工业技术—材料科学与工程] O482.52[电气工程—电工理论与新技术]