沉积参量对硼碳氮薄膜光透过性质的影响  

Influence of deposition parameters on transmission properties of boron carbon nitride thin films

作　　者：王玉新[1] 郑亚茹[1] 宋哲[1] 冯克成[2] 

机构地区：[1]辽宁师范大学物理与电子技术学院,辽宁大连116029 [2]长春理工大学理学院,吉林长春130022

出　　处：《功能材料》2008年第6期935-937,941,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(59831340);大连市科学技术基金资助项目(2007J23JH029)

摘　　要：采用射频磁控溅射技术，用六角氮化硼和石墨为溅射靶，以氩气（Ar）和氮气（N2）为工作气体，在玻璃衬底上制备出硼碳氮（BCN）薄膜。通过改变氮气分压比、衬底温度及沉积时间，研究了沉积参量对薄膜光透过性质的影响。利用X射线光电子能谱（XPS）、原子力显微镜（AFM）及可见-近红外透过光谱对薄膜进行了表征。实验结果表明，所制备薄膜在400～1000nm波段具有较高透过率。并且沉积参量对BCN薄膜的透过性能有很大影响，适当改变沉积参量能获得透过率高于90％的BCN薄膜。在固定其它条件只改变一个沉积参量的情况下，得到制备具有较高透过率的BCN薄膜的最佳沉积条件：氮气分压比为1／3、沉积温度为300℃、沉积时间为1h。Boron carbon nitride （BCN） thin films were deposited on glass substrate by radio frequency （RF） magnetron sputtering technique with a composite target consisting of h-BN and graphite in an Ar-N2 gas mixture. The influence of N2 partial pressure, deposition temperature and deposition time on the transmission properties of the BCN thin films were studied. The samples were characterized by XPS, AFM and Vis-IR transmission spectroscopy. These results suggested that the films had excellent transparency in the region from 400-1000nm. And the deposition parameters had important influences on the transmission properties of BCN thin films. So changing deposition parameters properly is a feasible method to deposit BCN thin films with excellent transmission of 〉90%. In the conditions of changing one parameter each time, the optimum deposition parameters to prepare BCN thin films with higher transmissivity were obtained. They are N2 partial pressure of 1/3, deposition temperature of 300℃ and deposition time of lh.

关 键 词：硼碳氮薄膜 射频磁控溅射 沉积参量 透过 性质 

分 类 号：O484.4[理学—固体物理]