退火温度对Fe/Pr/Cu多层膜巨磁阻的影响  

Effects of annealing temperature on GMR in Fe/Pr/Cu multilayer films

作　　者：韩庆艳[1] 成钢[1] 顾正飞[1] 黄治锋[1] 

机构地区：[1]桂林电子科技大学信息材料科学与工程系,广西桂林541004

出　　处：《桂林电子科技大学学报》2008年第3期225-227,共3页Journal of Guilin University of Electronic Technology

基　　金：广西自然科学基金项目(桂科基0575093)

摘　　要：通过采用直流磁控溅射法制备Fe/Pr/Cu多层膜,并在不同温度下进行高真空退火,同时用X射线衍射仪和四探针测试仪测量不同温度下样品的结构和磁电阻,最终可获得具有一定的周期性和层状结构的多层膜Fe/Pr/Cu.退火后其仍保持多层膜结构,但晶粒变大,磁电阻随磁场强度的增大而增大,GMR性能随退火温度的增大先增大后减小。Fe/Pr/Cu多层膜经不同温度相同时间热处理后,层间分离随温度的升高越来越明显,且磁电阻随温度的升高而增强。Fe/Pr/Cu multilayer films were first prepared onto substrates with magnetron controlled sputtering method and then annealed at different temperatures. Then the Fe/Pr/Cu multilayer films were examined with XRD to analyse their structures and with conventional four probes method to analyse their giant magnetoresistance respetively. The results indicated that the Fe/Pr/Cu multilayer films have certain periodicity and samdwich and keep them after annealing. The magnetoresistance of the Fe/Pr/Cumultilayer films increased as the magnetic in- tensity increased. The GMR performance of the Fe/Pr/Cumultilayer films increased first and decreased later as the annealing temperature increased. The Fe,Pr and Cu separation was also increasingly obvious and the GMR effect increased along with the increase of annealing temperature.

关 键 词：Fe/Pr/Cu多层膜 退火温度 巨磁阻效应 磁控溅射 

分 类 号：TG113.2[金属学及工艺—物理冶金]