软紫外光压印光刻的模具制造研究  

Template Fabrication on Soft Ultravialet Nanoimprint Lithography

作　　者：秦歌[1] 丁玉成[1] 刘红忠[1] 

机构地区：[1]西安交通大学机械制造系统工程国家重点实验室,西安710049

出　　处：《西安交通大学学报》2008年第7期880-884,共5页Journal of Xi'an Jiaotong University

基　　金：国家自然科学基金资助项目(50505037);国家高技术研究发展计划资助项目(2006AA04Z322;2006AA05Z411);国家重点基础研究发展计划资助项目(2003CB716203);陕西省自然科学基金资助项目(2006E109);西安-应用材料创新基金资助项目(XA-AM-200505;XA-AM-2006609)

摘　　要：在软紫外光压印光刻中,提出以光刻胶为母版材料翻制聚二甲基硅氧烷软模具的工艺方法,并把图型母版材料对软模具制造过程的影响进行了实验研究.研究表明,软模具图型质量仅和浇铸过程的充型压力有关,在0.05 Pa的真空压力下充型,光刻胶母版图型强度足够抵抗充型压力,所翻制的软模具复型精度为(97.24±0.60)%,复型精度方差为0.376%,在翻制软模具50次后,光刻胶母版图型无明显扭曲变形和缺损、污物.因此,采用光刻胶作为母版图型材料,不仅可以满足工艺精度的要求,而且可以提高生产率、降低生产成本.In soft Ultraviolet （UV） nanoimprint lithography, an improved template fabrication process utilizing photoresist as mold material was developed, which started with a direct casting of polydimethylsiloxane （PDMS） onto the photoresist mold pattern generated by direct electron beam writing. The process variables affecting the molding process and the transferring patterns were analyzed, the photoresist mold pattern and the PDMS template pattern were observed by scanning electron microscopy （SEM）. The results show that the features of the PDMS template are only related to the molding pressure and the strength of the photoresist mold is enough to resist the molding pressure under 0. 05 Pa in the vacuum casting. The replication accuracy of soft template generated by the photoresist mold gets curacy approaches to 0. 376%. The photoresist （97. 24±0. 60）% and the square root of the acpattern remains unstained and undamaged after casting PDMS onto it for 50 times. As a result, the process adopting photoresist as mold material enables to improve the throughput of soft UV nanoimprint lithography with a lower cost.

关 键 词：光刻胶 母版材料 软模具 

分 类 号：TN305.2[电子电信—物理电子学]