金属薄膜亚波长近场成像特性研究  

Study on the property of subwavelength imaging in a metal thin-film structure

作　　者：李明宇[1] 顾培夫[1] 张锦龙[1] 郑臻荣[1] 刘旭[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室,杭州310027

出　　处：《物理学报》2008年第7期4564-4569,共6页Acta Physica Sinica

基　　金：国家博士后科学基金(批准号:20070411174);国家自然科学基金(批准号:60478138;60608014)资助的课题~~

摘　　要：采用基于等离子体物理模型的时域有限差分方法模拟了金属薄膜近场成像特性;采用薄膜传输矩阵方法计算了金属薄膜对倏逝波分量的放大作用.实现了周期为1μm的Cr光栅的成像实验,验证了平板金属薄膜的模拟成像特性.The property of the near field subwavelength imaging in a metal thin-film structure is investigated using finite difference time domain method based on Drude model. Using the transfer matrix method, the transmission of this structure for the evanescent wave component is given, which illustrates the influence on the subwavelength imaging quality. In practice a Cr grating mask with 1μm period is imaged onto a photosensitive material through a silver thin film structure by utilizing the optical near-field lithography techniques.

关 键 词：时域有限差分 金属薄膜 近场亚波长成像 传输矩阵方法 

分 类 号：O484[理学—固体物理]