基于干涉显微原理的表面形貌测量系统  

Profilometer Based on Interferometry and Micro Vision System

作　　者：王海珊[1] 史铁林[1] 廖广兰[1] 刘世元[1] 张文栋[2] 

机构地区：[1]华中科技大学数字制造装备与技术国家重点实验室 [2]中北大学电子测试技术国家重点实验室,太原030051

出　　处：《光电工程》2008年第7期84-89,共6页Opto-Electronic Engineering

基　　金：国家自然科学基金资助项目(50535030);国家“973”计划资助项目(2003CB716207);国家“863”计划资助项目(2006AA4Z325);新世纪优秀人才支持计划资助项目(NCET-06-0639)

摘　　要：根据光学干涉显微法原理,设计开发了一套微纳结构表面形貌测量系统。该系统采用林尼克干涉显微镜,通过参考镜扫描的方法将扫描器与相移器集为一体,分别采用五步相移算法和基于采样定理的包络均方函数(SEST)算法实现相移干涉法(PSI)和垂直扫描干涉法(VSI)两种模式对微纳结构的表面形貌测量。为验证该系统性能,采用标准多刻线样板和标准台阶作为样件对VSI和PSI两种模式分别进行了测量实验。结果证明,该系统能够完成微纳结构表面形貌的快速精确测量,可以满足微电子、微机电系统中微纳结构的表面形貌测量要求。A profilometer was developed for micro-nano structure profile testing on the basis of interferometry and micro vision system. A Linik interferometer was adopted in this profilometer, in which the scanner and the phase shifter were integrated through scanning the reference mirror. The five-step phase-shift algorithm was selected for Phase Shift Interferometry （PSI） mode and the Squared-Envelope function estimation by Sampling Theory （SEST） algorithm was selected for Vertical Scanning Interferometry （VSI） mode. The experiments that used a standard multi-indents structure and a standard step structure to test PSI mode and VSI mode respectively verified that the profilometer could measure the profile of the micro-nano structure quickly and accurately, and be applied in the measurement of micro-electronics and micro electronic mechanic system.

关 键 词：相移干涉法 垂直扫描干涉法 林尼克干涉结构 五步相移算法 SEST算法 

分 类 号：TH741.3[机械工程—光学工程]