氧化钨电致变色薄膜的XPS分析  

XPS Analyses on WO_x Electrochromic Films

作　　者：李海霞[1] 唐武[1] 翁小龙[1] 邓龙江[1] 孔占兴[1] 

机构地区：[1]电子科技大学电子薄膜与集成器件国家重点实验室,四川成都610054

出　　处：《稀有金属材料与工程》2008年第7期1213-1216,共4页Rare Metal Materials and Engineering

基　　金：国家自然科学基金资助(50601005)

摘　　要：采用射频磁控溅射工艺,在柔性PET衬底上低温制备电致变色WOx/ITO/PET多层薄膜;利用X射线光电子能谱(XPS)分析所制备薄膜的着、退色态中W元素的价态以及O元素的化合环境。结果表明:WOx薄膜着色态中存在W6+和W5+的混合价态,而在退色态中W元素的化合价仅为W6+;钨离子的不同价态和氧离子的不同化合环境的变化与WOx薄膜的电致变色机制密切相关。WOx/ITO films are deposited on a soft polyethylene terephthalates （PET） substrate by RF magnetron sputtering. The ion valence states of W and the binding energy of O in the colored and the bleached WOx films are analyzed by XPS. It is found by XPS that the W^6＋, W^6＋ ions co-exist in the colored WOx films, but only W^6＋ ions are detected in the bleached WOx films. The change of chemical state of W and the binding energy of O have close relationships with the two electrochromic mechanisms of WOx films.

关 键 词：WOx薄膜 电致变色 磁控溅射 

分 类 号：TB383.2[一般工业技术—材料科学与工程]