Experimental Studies on Elimination of Microbial Contamination by Hydroxyl Radicals Produced by Strong Ionization Discharge  

作　　者：白敏冬 张芝涛 赵董艳 杨波 

机构地区：[1]Department of Physics,Dalian Maritime University,Dalian 116026,China

出　　处：《Plasma Science and Technology》2008年第4期463-465,共3页等离子体科学和技术（英文版）

基　　金：National Natural Science Foundation of China(Nos.50578020,60471036)

摘　　要：Using fogdrops of OH^· radicals to eliminate microbial contamination is an effective way to solve the current domestic and international problem. The results show that the threshold of OH solution used in the experiment is 0.6 mg/L, the lethal time is 1 s, and the spray density of OH solution is 21 μL/m^2. The experimental results show that the OH radical possesses the following advantages： celerity, low lethal concentration and spray density, short lethal time, and absence of secondary pollution.Using fogdrops of OH^· radicals to eliminate microbial contamination is an effective way to solve the current domestic and international problem. The results show that the threshold of OH solution used in the experiment is 0.6 mg/L, the lethal time is 1 s, and the spray density of OH solution is 21 μL/m^2. The experimental results show that the OH radical possesses the following advantages： celerity, low lethal concentration and spray density, short lethal time, and absence of secondary pollution.

关 键 词：microbial contamination OH^· radical elimination technology 

分 类 号：X132[环境科学与工程—环境科学] O539[理学—等离子体物理]