用椭偏光谱法测量很薄固体膜的光性  

Determination of Optical Properties of Very Thin Films by Spectroscopic Ellipsometry

作　　者：黄炳忠[1] 陈土培 

机构地区：[1]中山大学物理系

出　　处：《分析测试通报》1989年第2期1-5,共5页

摘　　要：本文讨论了利用棉偏光谱法测量很薄固体膜的光性的原理和方法,包括椭偏计算模型的建立、模型的合适性等问题,考察了环境介质-薄膜-衬底三根系统和环境介质-薄膜-界面过渡层-衬底四相系统,并引入了一种简化椭偏计算的方法。此外,本文也给出了两个研究实例,包括Si衬底上的Pt膜和PtSi膜。In this paper, the method for Spectroscopic ellipsometric determination of very thinsolid films including establishment of model for ellipsometric calculation and its feasibility,were described.And systems of ambientthin film-substrate,and ambient-thin film-interface layer-substrate were investigated.A simplified ellipsometric calculation method for two examplesof Pt film and PtSi film on Si substrates were discussed.

关 键 词：薄膜 椭偏光谱法 光学性质 

分 类 号：O484.5[理学—固体物理]