磁控溅射参数对ZrB_2/ZrAlN纳米多层膜结构和性能的影响  

Effect of parameter of magnetron sputtering on microstructure and properties of nanoscale ZrB_2/ZrAlN multilayered films

作　　者：亢原彬[1] 董磊[1] 刘思鹏[1] 乔林[1] 陈宗强[1] 邓湘云[1] 李德军[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300387

出　　处：《天津师范大学学报（自然科学版）》2008年第3期30-32,共3页Journal of Tianjin Normal University：Natural Science Edition

基　　金：天津市科技计划国际合作项目(07ZCGHHZ01500)

摘　　要：选择ZrB2和ZrAlN作为个体层材料,利用超高真空射频磁控溅射系统在80 nm调制周期下,制备了一系列ZrB2/ZrAlN纳米多层膜,用XRD、表面轮廓仪和纳米力学测试系统分析了物相及晶体结构.研究表明:纳米多层膜体系的各项性能随着Ar/N2流量比例的变化而变化,多层膜的纳米硬度值和弹性模量均高于两种个体材料混合相的硬度值,残余应力也得到缓解,合适的N2气分压可以使多层膜体系的机械性能达到最佳.A series of nanoscale ZrB2/ZrAlN multilayered films were prepared with ZrB2 and ZrAlN as individual layered materials by using ultra-high vacuum radio frequency magnetron sputter system at the modulation period of 80 nm.The phase and crystal structures of the films were analyzed by using XRD,profiler and nano indenter.The results showed that the properties of the multilayered films changed with the Ar/N2 flow ratio.The multilayered films exhibited higher nanohardness and elastic modulus than the rule-of-mixture value of monolithic ZrB2 and ZrAlN films,and the residual stress was also released.The mechanical properties of the multilayered films reached optimal at proper N2 partial pressure.

关 键 词：ZrB2/ZrAlN纳米多层膜 射频磁控溅射 Ar/N2流量比例 硬度 

分 类 号：TG174.444[金属学及工艺—金属表面处理] TG174.4[金属学及工艺—金属学]