电子束蒸发法在多孔氧化铝膜上制备银纳米点阵列  

Preparation of Ag nanodot array on porous alumina membrane by electron beam evaporation

作　　者：高芬[1] 

机构地区：[1]西安工业大学光电工程学院,西安710032

出　　处：《光学技术》2008年第4期549-551,共3页Optical Technique

摘　　要：采用二步阳极氧化法在草酸溶液中制备了高度有序的多孔阳极氧化铝(Porous Anodic Alumina,PAA)薄膜。以多孔氧化铝薄膜为模板,采用真空电子束蒸发的方法在多孔氧化铝模板上制备出了高度有序的金属银纳米点阵列体系。扫描电镜(SEM)测试结果表明,所制备的金属银纳米点阵列与多孔阳极氧化铝膜的多孔阵列具有完全相同的有序结构,阵列中银纳米颗粒的形状接近球形,其直径大约为70nm,与氧化铝模板的孔径基本一致。研究了高度有序银纳米点阵列的形成过程。The highly ordered porous anodic alumina（PAA）films are fabricated by two-step anodizing process in oxalic acid solution.Highly ordered metal AN nanodot arrays are fabricated by vacuum electron beam evaporation method using porous anodic alumina mask as evaporation mask.The scanning electron microscopy（SEM）results indicate that the microstructure of Ag nanodot array is the complete same with that of PAA membrane.Each Ag nanoparticle is a spherical object in nanodot arrays,Ag nanodot diameters are approximately 70nm and its diameter approximates the pore diameter of the PAA membrane. The forming process of Ag nanodot array is investigated.

关 键 词：电子束蒸发 多孔阳极氧化铝 银 纳米点阵列 

分 类 号：O484.1[理学—固体物理]