离子注入与沉积TiN膜层中的残余应力  

Residual stress in TiN film fabricated by ion implantation and deposition technique

作　　者：刘洪喜[1] 蒋业华[1] 周荣[1] 冷崇燕[1] 汤宝寅[2] 

机构地区：[1]昆明理工大学机电工程学院材料成形与控制系,云南昆明650093 [2]哈尔滨工业大学现代焊接生产技术国家重点实验室,黑龙江哈尔滨150001

出　　处：《材料热处理学报》2008年第4期161-165,共5页Transactions of Materials and Heat Treatment

基　　金：国家自然科学基金项目(50601010)

摘　　要：利用掠入射X射线衍射(GIAXRD)研究了GCr15轴承钢表面等离子体浸没离子注入与沉积(PIII&D)氮化钛(TiN)薄膜后膜层表面的应力状态。用X射线衍射(XRD)分析了处理后膜层的化学组成。探讨了薄膜厚度和掠入射角对表面膜层中应力变化规律的影响。结果表明,表面膜层中主要存在TiN相,同时含有少量的TiO2和钛氮氧的化合物。不同工艺下,TiN/GCr15轴承钢试样表面膜层中存在的应力均为压应力;且应力值随着掠入射角度的增大而减小,随着薄膜厚度的增加而降低。Titanium nitride （TIN） films were fabricated on GCr15 bearing steel substrate by plasma immersion ion implantation and deposition （PIII＆D） technique. The residual stress of the film was characterized by means of glazing incidence angle X-ray diffraction （GIAXRD） method. The effect of film thickness and glazing incidence angle on residual stress were investigated. X-ray diffraction （XRD） analysis indicates that PIII＆D results in the formation of TiN phase and a small quantity of TiO2 and TiNxOy, Residual stress measurement result shows that the stress exhibits compressive stress, and the compressive stress value decreases with increase of the film thickness and glazing incidence angle.

关 键 词：等离子体浸没离子注入与沉积(PIII&D) 掠入射X射线衍射(GIAXRD) TIN薄膜 残余应力 GCR15钢 

分 类 号：TG172.44[金属学及工艺—金属表面处理]