铁钝化膜的光电化学研究  

Photoelectrochemical Investigation of Iron Passive Film

作　　者：张国栋[1] 

机构地区：[1]华东冶金学院化学工程系

出　　处：《华东冶金学院学报》1990年第3期61-68,103,共9页

摘　　要：本文研究了在pH=8.4的硼酸/硼酸钠溶液中铁钝化膜的光电化学行为。讨论了钝化时间、入射光强、电极电位以及光子能量对光电流的影响,指出铁钝化膜具有非晶态n型半导体特性。A theoretic model, which can be used to illustrate photoelectroche- mical behavior of the iron passive film, has been proposed.Based on this model, the depedence of the photocurrent on the film-forming potential the measuring potential φ_m and the wavelength of incient light have been studied. The conclution is that, the iron passive film is n-type noncrystalline Semiconductor, its flatband energe E_g is affected by measuring potential, when 0.30V<m<0.80V (SCE), E_g equels 1.9eV.

关 键 词：铁钝化膜 光电流 非晶半导体 

分 类 号：TG175.1[金属学及工艺—金属表面处理]