化学气相沉积钨的组织与力学性能研究  

Microstructure and mechanical properties of CVD tungsten

作　　者：侯岳翔[1] 李树奎[1] 孙红婵[1] 鲁旭东[1] 宋修纲[2] 

机构地区：[1]北京理工大学材料科学与工程学院,北京100081 [2]黑龙江北方工具有限公司、黑龙江牡丹江157000

出　　处：《兵器材料科学与工程》2008年第5期54-57,共4页Ordnance Material Science and Engineering

摘　　要：用扫描电镜上的EBSD装置研究化学气相沉积法制备的高纯钨的晶体取向,化学气相沉积钨具有{110}〈001〉取向织构;用电子万能试验机和分离式霍普金森杆(SHPB)研究纯钨的准静态(10-3s-1)和动态(2000～5000s-1)压缩力学性能,并与等轴晶重熔钨进行对比分析,沉积钨的屈服强度由静态时的1350MPa上升到动态时的2000MPa以上,是应变率敏感材料,等轴晶纯钨的静动态屈服强度高于柱状晶沉积纯钨,柱状晶沉积纯钨有明显的应变硬化效应。沉积钨柱状晶组织的塑性变形方式除滑移外,还有大量的孪晶产生。The pure polycrystalline tungsten was fabricated by Chemical Vapor Depositision method. The grain orientation was tested by EBSD, and the quasi-static and dynamic compression tests were realized by electromechanical universal testing machine and split Hopkinson bar. It is found that the CVD tungsten grain is 〈100〉 texture, the static yield stress of CVD tungsten is approximately 1 350 MPa and the dynamic yield stress is above 2 000 MPa,which show that CVD tungsten is a strain rate sensitive material. The yield stress of uhrafine grained tungsten is higher than that of columnar-grained tungsten, and columnargrained tungsten has obvious strain hardening effect. The plastic deformation mechanisms of CVD tungsten are slip and twinning.

关 键 词：化学气相沉积 应变率效应 力学性能 高纯钨 变形机制 

分 类 号：TG146[一般工业技术—材料科学与工程]