用弯曲磁过滤提高弧离子镀TiN薄膜质量  

Effect of curved magnetic filtering on quality of TiN thin films prepared by the AIP technique

作　　者：瞿全炎[1,2] 曾德长[1] 史新伟[3] 刘正义[1] 

机构地区：[1]华南理工大学机械工程学院,广东广州510640 [2]广东省特种设备检测院,广东广州510655 [3]郑州大学材料科学与工程学院,河南郑州450052

出　　处：《兵器材料科学与工程》2008年第4期36-40,共5页Ordnance Material Science and Engineering

基　　金：广州市科技计划2006Z2-D0131与2006Z3-D0281的资助

摘　　要：采用弯曲磁过滤真空阴极放电弧离子镀法制备高质量TiN薄膜。用场致发射电子扫描显微镜观察薄膜表面与截面形貌。分析弯曲磁过滤对膜表面质量与晶粒尺寸、膜基结合形态的影响。磁过滤能有效减少大颗粒数量,减小大颗粒尺寸,形成光滑的TiN薄膜表面,细化TiN晶粒,形成结合紧密的膜基结构。High quality TiN thin films were prepared by vacuum cathode discharge arc ion plating （ALP） technique with a curved magnetic filter. The surface morphologies and cross section morphologies of thin films were observed by field emission electronic scanning microscope. The effect of curved magnetic filtering on the surface quality, grain size and film-to-substrate bonding condition was studied. The results show that magnetic filtering can efficiently diminish the number and size of macroparticles, smoothen thin film surface, refine TiN grains and fabricate a tight bonding film-to-substrate interface.

关 键 词：TIN薄膜 弯曲磁过滤 薄膜质量 粗大柱状晶 细小柱状晶 

分 类 号：TB34[一般工业技术—材料科学与工程]