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作 者:王立铎[1] 贺小明[1] 李文治[1] 王英华[1] 李恒德[1]
机构地区:[1]清华大学材料科学与工程系
出 处:《功能材料》1997年第6期660-661,655,共3页Journal of Functional Materials
摘 要:本文首先利用离子束溅射聚四氟乙烯靶材的方法制备了薄膜,进而研究了其结构。由XPS的结果可知,所得薄膜主要由CF2结构组成;由FTIR的结果可知,在1169cm-1和1083cm-1处出现了CF的最强吸收峰,在734cm-1,619cm-1和500cm-1处出现了聚四氟乙烯的特征吸收峰。XPS和FTIR的结果是一致的,所得薄膜呈现聚四氟乙烯的结构特征。Teflom thin films have been synthesized by ion beam sputtering teflon target and their structures have been studied by XPS and FTIR. XPS showed that the films mainly consisted of CF2 structure; FTIR indicated that the strongest absorption peak of CF appear at 1169cm-1 and 1083cm-1 and the characteristic absorption peak of teflon appeared at 734cm-1 ,619cm-1 and 500cm-1. The results of XPS and FTIR coincided with each other, the obtained films possessed the structural characteristic of teflon.
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