TiO2纳米薄膜的制备及其紫外-可见光谱研究  

Preparation of Anatase TiO_2 Nanofilm by Magnetron Sputtering and Their UV-vis Spectrum Analysis

作　　者：杜雯[1,2] 冶银平[1] 李红轩[1] 崔海霞[1] 

机构地区：[1]中国科学院兰州化学物理研究所,固体润滑国家重点实验室,兰州730000 [2]中国科学院研究生院,北京100049

出　　处：《材料工程》2008年第10期261-264,共4页Journal of Materials Engineering

基　　金：国家自然科学基金(50575217,50705093)

摘　　要：用磁控溅射技术在普通载玻片上制备了不同厚度透明的锐钛矿相二氧化钛(TiO2)纳米薄膜,利用X射线衍射仪(XRD)、场发射扫描电子显微镜(FE-SEM)等分析方法对试样进行表征,并测试了其紫外-可见透射光谱,计算了此薄膜的禁带宽度,其值接近TiO2禁带宽度的理论值3.2eV。The anatase TiO2 nanofilms with different thickness were prepared by magnetron sputtering. Detailed structural characterization of the films were carried out using XRD, FE-SEM method. The films UV-vis spectrum of transmittance were measured and analysised. The optical energy band gap of the as-obtained nanofilms were calculated. The calculated optical energy band gap were close to the theoretical value with 3.2eV.

关 键 词：磁控溅射 TiO2纳米薄膜 紫外可见光谱 禁带宽度 

分 类 号：O484.1[理学—固体物理]