碳纳米管聚合物复合膜的等离子刻蚀研究  

Plasma Etching of Carbon Nanotubes/polymer Composite Films

作　　者：杜招红[1] 曾效舒[2] 

机构地区：[1]南昌大学材料科学与工程学院,南昌330031 [2]南昌大学机电学院,南昌330031

出　　处：《人工晶体学报》2008年第5期1233-1236,共4页Journal of Synthetic Crystals

基　　金：江西省2006年科技厅工业攻关项目(No.S0004)

摘　　要：本文研究了等离子刻蚀碳纳米管(CNTs)聚合物复合膜的工艺,并采用测量接触电阻表征薄膜的刻蚀效果。用SEM对刻蚀前后的试样膜面进行了观测。结果表明电压为100 V,电流为0.52 A时可以有效地刻蚀掉在制备无衬底碳纳米管膜时附在其上的粘胶剂和聚合物。且刻蚀前后碳纳米管复合膜的电阻有很大变化,从110.2Ω降至8.4Ω。The methods for making carbon nanotubes （CNTs） / polymer composite films by plasma etching are researched. The etching result is described by touching resistance value. The sample velum is observed by SEM. As a result, the mucilage glue and polymer attching to the CNTs films without substrate can be etched effectually when voltage is 100 V and electrical current is 0.52 A, and the resistance of CNTs composite films drops from 110.2 Ω to 8.4 Ω.

关 键 词：等离子刻蚀 碳纳米管聚合物复合膜 电阻 

分 类 号：O78[理学—晶体学]