不同退火工艺Pt电极上沉积溶胶凝胶Pb(Zr,Ti)O_3薄膜的织构演化(英文)  

Texture Evolution of Sol-Gel-Derived Pb(Zr,Ti)O_3 Film on Platinum Bottom Electrode with Different Annealing Process

作　　者：杨帆[1,2] 费维栋[2] 

机构地区：[1]东南大学江苏省先进金属材料高技术研究重点实验室,南京211189 [2]哈尔滨工业大学,黑龙江哈尔滨150001

出　　处：《稀有金属材料与工程》2008年第10期1760-1765,共6页Rare Metal Materials and Engineering

基　　金：Jiangsu Planned Projects for Postdoctoral Research Funds (0602001A);China Postdoctoral Science Foundation Funded Project (20080431057)

摘　　要：利用溶胶凝胶工艺在Pt电极上沉积了PZT薄膜,选用传统退火及其快速退火工艺制备两种Pt基底(CTA-Pt和RTA-Pt),并采用X射线衍射广角及其ω扫描技术分别研究了Pt电极退火工艺对溶胶凝胶PZT结构及其织构演化的影响。研究结果显示:在传统退火工艺制备Pt电极上沉积的薄膜为(111)择优取向,而在快速退火工艺制备Pt电极上沉积的薄膜表现为(100)织构;分析表明PZT薄膜的织构演化可能与Pt电极在不同退火工艺下的内应力差异有关。Lead zirconate titanate （PZT） films were fabricated by sol-gel technique on different Pt electrode layers, i.e., CTA-Pt and RTA-Pt, which were subjected to conventional thermal annealing and rapid thermal annealing, respectively. The microstructures and phase compositions of sol-gel-derived PZT films were analyzed. Effects of Pt electrode subjected to different annealing processing on the texture of PZT films were investigated by using ~o-scan X-ray diffraction. The results indicated that the PZT thin films on CTA-Pt electrode were （111）-textured for various annealing temperatures, whereas the PZT films on the RTA-Pt electrode were （100）-textured. A possible scheme in consideration of the internal stress effect of Pt electrode was proposed to explain the texture evolution of films.

关 键 词：PZT薄膜 织构 X射线衍射 PT电极 

分 类 号：TG156.2[金属学及工艺—热处理]