全聚合物SU8光波导制备工艺及其特性研究  

Study on Fabrication Process and Characteristics of Full Polymer SU8 Optical Waveguide

作　　者：孔光明[1,2] 鄂书林[1] 邓文渊[1] 赵虎旦[1] 郭洪波[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春130033 [2]中国科学院研究生院,北京100049

出　　处：《半导体光电》2008年第5期662-665,共4页Semiconductor Optoelectronics

基　　金：吉林省科技厅项目(20060521);应用光学国家重点实验室基金项目(O6133FQ064)

摘　　要：对一种全聚合物SU8光波导的制备工艺和波导特性进行了研究。测试结果显示,所制备光波导在1550 nm的传输损耗为2.01 dB/cm,且具有高的侧壁陡直度。详细研究了光波导制备工艺过程中前烘温度和时间、光刻时间、后烘温度和时间以及显影时间等工艺参数对波导质量的影响,给出了4.5μm×4.0μm尺寸单模波导制备的优化工艺。讨论了采用稀释后的SU8材料所制备的光波导出现侧蚀的原因以及改进的方法。The fabrication process and characteristics of a full polymer optical waveguide based on SU8-2005 were studied. The measurement results showed that the propagation loss of the optical waveguide fabricated by this process is 2.01 dB/cm at 1 550 nm wavelength and its sidewall quality is high. The main process variations influencing the waveguide quality, such as pre-bake time and temperature, exposure time, post-bake time and temperature, development time, were studied. Then the optimized process for the fabrication of 4.5μm × 4 μm size single mode waveguide is proposed. Finally, the reason and the solution for the side erosion in the waveguide fabricated by the dilute material are discussed.

关 键 词：聚合物 SU8光波导 光刻 工艺参数 

分 类 号：TN252[电子电信—物理电子学]