反应离子束蚀刻中的草地现象及其改善  

The grassy prominence and its lustration in reaction ion etching processings

作　　者：王晓松[1] 冀翔 张恒伟 杨国光[1] 范秋虎 时海 

机构地区：[1]浙江大学现代光学仪器国家重点实验室 [2]63891部队

出　　处：《光学仪器》2008年第5期24-30,共7页Optical Instruments

摘　　要：针对波导沟道制作的蚀刻工艺,讨论利用反应离子束蚀刻技术制备波导沟道的工艺条件对面形的影响,对严重影响面型的草地现象形成原因和工艺改善进行实验实践,包括光刻胶、温度效应、二次效应等因素,并提出进行光学稳定、调节离子入射角和改变刻蚀气体压强等减小草地现象的措施,对蚀刻低损耗波导进行有益的探索。The reaction ion etching （RIE） processings influencing figure are discussed for waveguide fabrication in this paper. Grassy prominence, the key reason for bad figure, is particular discussed, and its forming is analysed including photoresist, temperature effect and quadratic effect. The effective lustrating techniques are also experimentalized in practice, such as photoresist optical stabilizing, inidence angle＇s adjusting and etching gas pressure alternating. It＇s beneficial to etching low loss waveguide.

关 键 词：反应离子束刻蚀(RIE) 温度效应 二次效应 草地现象 

分 类 号：TN405.98[电子电信—微电子学与固体电子学]