EACVD金刚石膜沉积设备衬底温度的测量  

Design of the Temperature Measurement System for EACVD Equipment

作　　者：钟磊[1] 卢文壮[1] 左敦稳[1] 林欢庆[1] 

机构地区：[1]南京航空航天大学机电学院,江苏南京210016

出　　处：《机械制造与自动化》2008年第5期30-32,共3页Machine Building & Automation

基　　金：国家自然科学基金资助项目(50605032);江苏省自然科学基金资助项目(BK2006189)

摘　　要：为了完善金刚石膜生长工艺,对衬底温度进行测量和控制,采用基于C8051F020单片机的热电偶多区域测量系统来收集EACVD设备的衬底温度。对测温的机械机构、电路方案及软件流程进行了详细的设计。经过验证该系统测温准确,效果良好。In order to improve the process technology of the diamond film deposition and to make the substrate temperature in the good control, a multi-point temperature measurement system is designed based on C8051F020 mcu. The mechanical structure, circuit and software are described in detail. It is proved that this system can work normally.

关 键 词：化学气相沉积法 衬底温度 热电偶 

分 类 号：TF068.21[冶金工程—冶金物理化学]