TiO2薄膜原子力显微镜图像多重分形谱的二次函数拟合  

Muitifractal description of atomic force microscope images of TiO_2 films by a quadratic function fitting

作　　者：吕建国[1] 孟凡明[1] 周明飞[1] 宋学萍[1] 孙兆奇[1] 

机构地区：[1]安徽大学物理与材料科学学院

出　　处：《功能材料》2008年第8期1352-1354,共3页Journal of Functional Materials

基　　金：国家自然科学基金(50642038);教育部博士点专项基金(20060357003);安徽省人才专项基金(2004Z029);安徽科技厅重点资助项目(05021028，07020203009);安徽省高等学校省级自然科学研究资助项目(KJ2007B135);安徽省高等学校青年教师科研资助计划项目(2006jql192)

摘　　要：用原子力显微镜观察经不同退火温度处理TiO_2薄膜的表面形貌,观察结果表明,随着退火温度的升高,颗粒不断长大,数目逐渐减少,表面粗糙度RMS从4.1nm增大到18.4nm。用最小二乘法对原子力显微镜图像多重分形谱进行二次函数拟合,结果显示,随着退火温度的升高,α_0从1.999增大到2.008,B由正值转变为负值,分形谱宽W由0.064增大到0.246,说明TiO_2薄膜表面形貌愈来愈复杂。Surface topographies of TiO2 thin films prepared by radio frequency magnetron sputtering technique for different annealed temperature are characterized by atomic force microscope. It indicates that as the annealed temperature increases, grain size of the film increases, the number of grains decrease and RMS roughness value of the films increases from 4. 1-18.4nm. Multi-fractal spectrum of atomic force microscope images was fitted to quadratic function by means of least square procedure. As the annealed temperature increases, α0 increases from 1. 999-2. 008, B value changes from positive to negative, the width of the spectrum W increases from 0. 064 to 0.246. The results show that the surface topography of TiO2 thin films become more complex.

关 键 词：TIO2薄膜 原子力显微镜 多重分形谱 二次函数拟合 

分 类 号：O766[理学—晶体学]