TaN/TiN和NbN/TiN纳米结构多层膜超硬效应及超硬机理研究  

Superhardness effect of TaN/TiN and NbN/TiN nanostructure multilayers and its mechanism

作　　者：喻利花[1] 董师润[1] 许俊华[1] 李戈扬[2] 

机构地区：[1]江苏科技大学材料科学与工程学院,江苏省先进焊接技术重点实验室,镇江212003 [2]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《物理学报》2008年第11期7063-7068,共6页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:50574044)资助的课题~~

摘　　要：采用射频磁控溅射方法制备单层TaN,NbN和TiN薄膜和不同调制周期的TaN/TiN和NbN/TiN纳米多层膜.薄膜采用X射线衍射仪、高分辨率透射电子显微镜和显微硬度仪进行表征.结果表明TaN/TiN和NbN/TiN纳米多层膜在一定的调制周期范围内均呈共格界面,相应地均出现了超硬效应,且最大硬度值接近.分析了TaN/TiN与NbN/TiN纳米多层膜的超硬机理,TaN/TiN的晶格错配度与NbN/TiN的接近,但TaN/TiN的弹性模量差与NbN/TiN的有一定的差别,表明由于晶格错配使共格外延生长在界面处产生的交变应力场是发生超硬效应的主要因素.Monolithic TaN,NbN,TiN films and TaN/TiN,NbN/TiN multilayers with different modulation periods were prepared by reactive magnetic sputtering.The films were characterized by X-ray diffraction,high-resolution transmission electron microscopy and nanoindentation.Results showed that there are coherent interfaces between the layers of TaN and TiN in TaN/TiN multilayers and the layers of NbN and TiN in NbN/TiN multilayers within a modulation period.The superhardness effect happened and the maximum hardness values of the two multilayers are nearly equal.The superhardness mechanism was discussed.The lattices mismatch between NbN/TiN and TaN/TiN multilayers is similar,but the difference in modulus of NbN/TiN multilayers is larger than that of TaN/TiN multilayers.It shows that stress field induced by coherent epitaxial growth is the main reason of superhardness effect.

关 键 词：TaN/TiN纳米多层膜 NbN/TiN纳米多层膜 外延生长 超硬效应 

分 类 号：O484.2[理学—固体物理]