磨料射流抛光中各工艺参数对材料去除率及抛光区形貌的影响  

Effects of Various Parameters on Material Removal Rate and the Footprint in Abrasive Jet Polishing Process

作　　者：李兆泽[1] 李圣怡[1] 戴一帆[1] 彭小强[1] 

机构地区：[1]国防科学技术大学,长沙410073

出　　处：《中国机械工程》2008年第21期2532-2535,共4页China Mechanical Engineering

基　　金：国家自然科学基金资助项目(50375156)

摘　　要：介绍了磨料射流抛光的工作原理,并从试验出发,针对射流抛光技术的主要工艺参数(入射角度、射流速度、入射距离、抛光液浓度和工作时间等)对抛光特性的影响进行了试验研究。分析了各工艺参数与抛光效率和抛光点形貌的影响关系,从而获得了最佳工艺参数。在此基础上,对一平面K9光学玻璃进行了抛光试验,抛光速率约为30nm/min,抛光区粗糙度小于2.5nm。研究结果为磨料射流抛光加工的进一步研究提供了一定的帮助。This paper firstly introduced the principles of abrasive jet polishing. Then some key in- fluence parameters of jet polishing technology, such as incidence angle, jet speed, incidence distance, abrasive concentration and processing time were investigated based on experiments. The relationships among various parameters and polishing efficiency and the footprint in polishing region were analyzed. Optimized relation curve of every parameter was obtained. Based on these, a plane K9 optical sample was polished. The polishing rate is about 30nm/min, and the roughness of this polishing region is less than 2.5nm. The results lay an experimental foundation for the further research of abrasive jet polishing.

关 键 词：磨料射流 抛光 去除率 表面粗糙度 

分 类 号：TH161[机械工程—机械制造及自动化]