聚苯乙烯一维纳米阵列的图案化  

Patterned polystyrene one-dimensional nanostructures arrays

作　　者：邵增军[1] 彭智[1] 宋国君[1] 姜宁[1] 王树龙[1] 

机构地区：[1]青岛大学高分子材料研究所,山东青岛266071

出　　处：《功能材料》2008年第11期1890-1893,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50473012)

摘　　要：采用紫外线光刻技术在阳极氧化铝模板(AAO)上生成预设图案,用物理浸润的方法在图案化的模板上生长聚苯乙烯,最后用NaOH和磷铬酸溶液分别溶解模板。采用扫描电子显微镜(SEM)和电子能谱(EDS)分析。结果表明,制备的图案是直径5μm的圆形组成,圆形图案中心之间距离是10μm,每个圆中长满一维纳米阵列,其纳米特性没有变化。Ultraviolet radiation（UV）photolithographic methods are utilized to form set patterns onto porous anodic aluminum oxide （AAO） templates. Then,polystyrene one-dimensional nanostructures are prepared by depositing a solution of polystyrene into this modified template. Samples are dissolved by NaOH and the mixture of phosphoric acid and chromic acid solution. The products were characterized by scanning electron microscopy （SEM） and energy dispersive spectroscopy （EDS）. The results illustrated that the pattern contains many identical circular structures;the diameter of each rotundity is about 5μm. And the space between circularities is also 10μm. The array of polymer one-dimensional nanostructures arrays fill in the pattern, however,the properties of polystyrene nanostructures are same as we prepared previously.

关 键 词：紫外光 苯乙烯 一维纳米结构 光刻胶 图案化模板 

分 类 号：TB383[一般工业技术—材料科学与工程]