真空蒸发镀膜设备性能的改进  

Performance improvement of vacuum evoporation coater

作　　者：陈素君[1] 陈月增 

机构地区：[1]北京北仪创新真空技术有限责任公司,北京102600

出　　处：《真空》2008年第6期40-43,共4页Vacuum

摘　　要：为提高镀膜设备的效率及可靠性,以适应技术发展需要,对真空镀膜设备的设计制造(重点是箱式前开门型设备)方面,对镀膜室的布局,基片装载量及真空系统的配置和电气控制等方面进行了适当的改进,提高挡次。并尽可能留有增加可选配功能部件的装配位置,如光学膜厚测量控制装置和石英晶体膜厚测量控制仪,低能宽束离子源,氩离子射频轰击装置等改进膜层质量,扩大功能适应各种使用要求。To improve the efficiency and reliability of vacuuum evaporation systems so as to meet the new technological requirements for various optical and electrical thin films, we updated and reformed the design and manufacturing process of such vacuum thin film coating systems especially the HV front door box-type coaters. Based on the original specifications, the layout of coating chamber, loading capacity of substrates, configuration of vacuum system and electric control system have all been improved properly. To improve further the layer/film quality and extend the functional fields for various unexpected applications, some positions or spaces were preset in design as possible for mounting optionally the potential devices, such as optical film thickness measuring/controlling system, quatz film thickness gauge, low-energy broad beam ion source and RF Arion bombardment system.

关 键 词：真空蒸发镀膜设备 真空性能 装载量 自动控制 多功能 

分 类 号：TB43[一般工业技术] TB75