ICP-AES法测定氧化铪中12种杂质元素  

Determination of impurities in HfO_2 by ICP-AES

作　　者：颜广炅[1] 童坚[1] 李娜[1] 张卓[1] 

机构地区：[1]北京有色金属研究总院,北京100088

出　　处：《分析试验室》2008年第12期107-109,共3页Chinese Journal of Analysis Laboratory

摘　　要：建立了电感耦合等离子发射光谱法测定氧化铪中Al、Ca、Mg、Mn、Na、Ni、Fe、Ti、Zn、Mo、V、Zr等12种杂质元素的分析方法。方法的检测范围为0．004％～5％，标准偏差小于7％，加标回收率94％～103％，方法已用于常见样品分析：In this paper, we established a new method which can analyze 12 kinds of impurities in HfO2 by ICP-AES. The determination range of the impurities was 0.004% - 5%, recoveries were 94% - 103% and the RSDs of determination were 1.0% -6.8%. It has been applied to the determination of impurities in HfO2.

关 键 词：ICP—AES 铪 氧化铪 

分 类 号：O657.3[理学—分析化学]