磁控溅射Ti_(1-x)Al_xN薄膜的微结构及性能研究  

Microstructure and properties of TiAlN films prepared by magnetron sputtering

作　　者：喻利花[1] 董松涛[1] 钟春良[1] 董师润[1] 许俊华[1] 

机构地区：[1]江苏科技大学材料科学与工程学院先进焊接技术重点实验室,江苏镇江212003

出　　处：《金属热处理》2008年第11期55-58,共4页Heat Treatment of Metals

基　　金：国家自然科学基金(50574044)

摘　　要：利用磁控反应溅射法制备了不同Al含量的Ti1-xAlxN薄膜。采用能谱仪、X射线衍射仪及纳米显微力学探针分析了薄膜的成分、微结构及薄膜的硬度,研究了Al含量对薄膜的微结构、硬度及高温抗氧化性能的影响。结果表明,薄膜为面心立方结构,呈(111)择优取向;薄膜的硬度及抗氧化性能均随着Al含量增加而提高。A series of Ti1-xAlxN films were deposited on different substrates by use of reactive magnetron sputtering. The composition, microstrueture and microhardness of the films were analyzed by energy dispersive spectroscopy, X-ray diffraction and nano-indenter. The effects of A1 content on microstructure, hardness and oxidation resistance of the films at high temperature were studied. The results show that the films have the fcc-TiN structures with （111 ）preferred orientation. The oxidation resistance and hardness of Ti1-xAlxN films increase with the increase of A1 content.

关 键 词：磁控溅射法 Ti1-xAlxN薄膜 微结构 抗氧化性能 硬度 

分 类 号：TG174.44[金属学及工艺—金属表面处理]