光学元件聚氨酯抛光特性研究  

Investigation of Optical Components Polished with Polyurethane Pad

作　　者：李亚国[1] 王健[1] 许乔[1] 杨炜[2] 周治鑫[1] 郭隐彪[2] 

机构地区：[1]成都精密光学工程研究中心,成都610041 [2]厦门大学机电工程系,福建厦门361005

出　　处：《光电工程》2008年第11期139-144,共6页Opto-Electronic Engineering

基　　金：国家高技术研究发展计划863-804项目资助

摘　　要：本文研究了应用于平面光学元件的快速抛光技术,从材料去除率、元件面形和表面粗糙度出发,对快速抛光技术应用于平面大口径元件的加工效果进行了探讨。研究了在快速抛光技术中压力和主轴转速对材料去除率的影响,验证了Preston公式在快速抛光中的适用性,快速抛光技术的去除效率可达10μm/h;其次,研究了聚氨酯抛光元件面形的精度,对于330mm×330mm元件可达～1.0λ(λ=632.8nm);最后,对快速抛光系统中抛光粉颗粒大小及形态随使用时间的变化进行了观测,并测量了使用300目和500目抛光粉时快速抛光元件表面粗糙度以及其随抛光粉使用时间的变化。The effect of high speed polishing process was investigated, which was applied to polish large optical flatware. Material removal rate as well as surface roughness was measured, which was used to evaluate the quality of optical component. The effect of pressure and spindle speed on material removal rate was researched, which was up to 10um/h in our experiments. The results of experiments coincided with Preston＇ formula. Moreover, the surface form of optical components polished by high speed polishing is -1.0λ（λ=632.8 nm）. Last, surface roughness induced by high speed polishing with different size polishing agents （300 and 500 mesh size） was also observed. Our results show that the surface roughness is proportional to the size of polishing agent which deceases with the time of use.

关 键 词：聚氨酯 材料去除率 元件表面面形 表面粗糙度 

分 类 号：TQ171.734[化学工程—玻璃工业]