脉冲激光沉积AZO薄膜及其光学性质研究  

Pulsed laser deposition of AZO film and the optical properties

作　　者：江超[1] 王又青[2] 

机构地区：[1]湖北师范学院生化分析湖北省重点实验室,黄石435002 [2]华中科技大学光电子科学与工程学院,武汉430074

出　　处：《激光杂志》2008年第5期79-80,共2页Laser Journal

基　　金：湖北省教育厅重点项目(D20062202);湖北省优秀中青年科技创新团队[2003-7];黄石市科技局项目[2005-37]

摘　　要：给出了在氧气气氛中利用单束脉冲激光交替作用锌靶和铝靶进行掺铝氧化锌(AZO)透明导电薄膜的脉冲激光沉积(PLD)新方法,分析了该方法的特点与优点,并与利用ZnO陶瓷掺杂靶制备AZO薄膜的方法进行了对比。利用该方法分别在玻璃片和硅片上制备了AZO薄膜,用SEM观察了薄膜的表面型貌,用X射线衍射谱(XRD)研究厂薄膜的结构,最后通过透射光谱分析了制备的透明导电膜在可见光区的透射性能。实验结果表明:利用该方法能够制备出性能优越的AZO功能薄膜。A new method of pulsed laser deposition of the AZO film in O2 atmosphere using single - beam pulsed laser alternately ablating double targets of Zn and AI is introduced. And the advantages of this method are intreduced. It is compared to the method of AZO fihn deposition using of AI doped ZnO ceramic target. The proness of depositing AZO fihn on glass and silieon using this method is deschbed in detail. The surface of the films is observed by SEM. The structure of the films is analyzed with X - ray diffraction spectrum. Finally the transmission optical properties of the films are studied using its transmissio spectrum. The results of the experiments show that the outstanding AZO films can be preparated by the method.

关 键 词：脉冲激光沉积 AZO薄膜 交替打靶 XRD 

分 类 号：TN249[电子电信—物理电子学]