溅射条件对ZnS薄膜的光学常量和微结构的影响  

Optical Constants and Microstructure of the Zns Film by RF Sputtering

作　　者：赵培[1] 刘定权[1] 徐晓峰[2] 张凤山[1] 

机构地区：[1]中国科学院上海技术物理研究所,上海200083 [2]东华大学理学院,上海200051

出　　处：《光子学报》2008年第12期2482-2485,共4页Acta Photonica Sinica

摘　　要：为了研究制备条件对射频溅射ZnS薄膜光学常量和微结构的影响,在浮法玻璃上制备了不同溅射气压、溅射功率和溅射温度的ZnS薄膜,利用紫外可见近红外分光光度计在300～2500nm的波长范围内测量了薄膜的透射和反射光谱,并通过光谱拟和计算出ZnS薄膜的光学常量以及禁带宽度.通过X射线衍射分析了薄膜的微结构随溅射温度的改变.研究结果表明,随着制备条件的不同,ZnS薄膜的光学常量和微结构会发生变化.ZnS films were deposited on the float glass for researching the effect on the optical constants and microstructure of film by the sputtering conditions. The deposition conditions were changed from the respect of pressure, power and temperature of substrate. The spectral transmittance and reflectance were measured in the range of 300-2 500 nm by using a spectrometer. From the spectrum,the optical constants and the band gap were calculated. The change of the film microstructure with the substrate temperature was analyzed by the X diffraction method. The result shows that there are little difference in the optical constants and microstructure of samples sputtered by different sputtering conditions.

关 键 词：射频溅射 ZNS 光学常量 微结构 

分 类 号：O439[机械工程—光学工程] O436.3[理学—光学]