制备光学薄膜的离子源技术概述  

Lastest Development of Ion Beam Sources Fabricated with Optical Coatings

作　　者：尤大伟[1] 

机构地区：[1]中科院空间中心,北京100080

出　　处：《真空科学与技术学报》2009年第1期107-113,共7页Chinese Journal of Vacuum Science and Technology

摘　　要：随着工业技术的发展及市场的需求,低能宽束离子源已广泛应用于微细加工的离子束刻蚀技术、材料改性的离子束注入混合技术和光学薄膜制备的离子束辅助镀膜技术。本文在多年该技术的实践与发展基础上,总结了制备光学薄膜的各种常用辅助镀膜离子源,其中包括考夫曼离子源、霍耳离子源、射频离子源、无栅离子源、阳极层离子源(均由我们实验室制造)的工作原理,设计要点,分析了使用时可能出现的问题及解决办法,最后从各种离子源的工作机制、工作特点、性价比、优缺点上予以比较。相信会有益于从事薄膜的工作者。The latest development of a variety of ion beam sources, fabricated in our lab with optical coatings grown by ion beam assisted deposition （lAD）, such as Kaufman ion source, Hall ion source, RF ion source, advanced plasma （APS） ion source, and anode layer ion source, was tentatively reviewed. The discussions focus on their operation principles, their design considerations, their strengths and weaknesses, and their operation problems and possible solutions. Their cost performance ratios were also compared from the experimental point of view. And some of their applications, including ion beam etching, micro fabrication, ion implantation and surface modification were also discussed.

关 键 词：光学薄膜镀膜 辅助镀膜离子源 离子束辅助镀膜 

分 类 号：TL503.3[核科学技术—核技术及应用]