球面投影光刻物镜的设计  

Design of Spherical Surface Imaging Projection Lithography Lens

作　　者：赵立新[1] 张雨东[1] 王建[1] 戴云[1] 高洪涛[1] 董小春[1] 饶学军[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《光电工程》2009年第1期93-97,共5页Opto-Electronic Engineering

基　　金：国家863计划资助项目(2006AA02Z4D2)

摘　　要：针对人工晶体或隐形眼镜的面形上连续浮雕结构加工的特点,本文介绍了基于空间光调制器(DMD)曲面投影光刻物镜系统的设计方法。根据其成像面为曲面的特点,根据光学设计理论多次利用弯向物方的弯月形负透镜结构进行场曲校正,同时运用光的衍射原理优化设计物镜系统的数值孔径以消除DMD投影过程中的栅格效应。运用ZEMAX工程光学设计软件对系统进行了模拟、优化,并对优化后的结果进行了分析。对于设计实例利用上述设计原则给出了设计结果,工作波长为g线(峰值波长λ=436nm),像面曲率r=22.5mm,视场Ф6mm,数值孔径NA=0.1,分辨力为7.8μm(64lp/mm)时的光学调制传函值>0.8,畸变<±0.05%。Referring to the fabrication characteristics of three-dimensional continuous microstructure on the intraocular lens or contact lens, the method for designing spherical surface imaging projection lithography lens was introduced based on the spatial optical modulator such as Digital Mirror Device （DMD）. According to characteristics of the projection lens, the image-surface was spherical, and the field curvature was corrected by the negative lens. According to the diffraction theory, the numerical aperture was optimized in order to eliminate the DMD structure effect. Integrated with the grid of DMD imaging, projection lens were simulated, designed and optimized by using ZEMAX optical design software, and the optimized results were analyzed .For the designed example, its working wavelength is g-line （436 nm）, radical curvature of imaging surface is 22.5 mm, imaging area is φ6 mm, numerical aperture NA=0. 1, MTF〉 0.8 at the resolution of 7.8 μm（64 lp/mm）, and its distortion 〈 ±0.05%.

关 键 词：球面光刻 投影物镜 DMD 光学设计 

分 类 号：TN305[电子电信—物理电子学] TB851[一般工业技术—摄影技术]