反应烧结碳化硅反射镜表面改性技术  

Surface Coating Technique of Reaction Bonded SiC Mirrors

作　　者：徐领娣[1,2] 张学军[1] 王旭[1,2] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,长春130031 [2]中国科学院研究生院,北京100039

出　　处：《光电工程》2009年第1期120-124,共5页Opto-Electronic Engineering

基　　金：国家杰出青年基金资助项目(69925512)

摘　　要：为了解决新型优质光学材料—反应烧结碳化硅(RB-SiC)由SiC和Si两相结构引起的光学表面缺陷问题,提出了反射镜表面改性方案并且从加工工艺的角度介绍了改性工艺流程。以空间反射镜的使用环境为依据,对几种适用的RB-SiC改性材料进行了较为全面的分析比较。本文采用新的离子辅助沉积碳化硅(IAD-SiC)材料为改性层,对改性层的表面形貌及部分性能进行了测试,证明IAD-SiC膜层能够满足改性要求。在厚度为(6±0.5)μm的IAD-SiC膜层表面进行了一系列抛光工艺实验,文中给出了超光滑表面抛光工艺参数和实验结果。对改性层进行精抛光后,100mm口径样片的面形精度为0.033λRMS(λ=632.8nm),表面粗糙度优于0.5nmRMS。结果表明,本方法不仅可以很大程度提高元件表面质量,还可以进一步精修面形,为超光滑、低散射RB-SiC反射镜的加工提供了一条可行途径。Recently, Reaction Bonded-SiC （RB-SiC） has become the most promising space mirror material due to its superior mechanical, thermal and physical properties. But surface roughness ＆polished RB-SiC is limited by the Si/SiC two phase structure of the material. To solve this problem, a kind of surface coating technique was introduced to obtain ultra-smooth optical surface. Firstly, according to the application environment of space mirrors, proper coating materials were analyzed generally. Secondly, SiC deposited by new Ion Assisted Depositing （IAD） technique was chosen to be the coating material and properties of IAD-SiC film were tested. Finally, a series of polishing experiments on 6 5：0.5 μm thick IAD-SiC layers were accomplished. Results show that surface roughness of the finished coating achieves less than 0.5nm RMS and the final surface figure is 0.033X RMS （λ=632.8nm）. The technique shows an access to process ultra-smooth and low scatter RB-SiC mirrors.

关 键 词：反应烧结碳化硅 表面改性 表面粗糙度 离子辅助沉积碳化硅 超光滑表面 

分 类 号：TQ171.6[化学工程—玻璃工业]