基体偏压对磁控溅射类石墨镀层摩擦磨损性能的影响  

Influence of Bias Voltage on the Tribological Properties of Graphite-Like Carbon Coatings Prepared by Magnetron Sputtering

作　　者：严少平[1,2] 蒋百灵[1] 苏阳[1] 张永宏[1] 

机构地区：[1]西安理工大学材料科学与工程学院,陕西西安710048 [2]安徽理工大学应用物理系,安徽淮南232001

出　　处：《摩擦学学报》2008年第6期491-496,共6页Tribology

基　　金：国家“863”科技攻关项目资助(2005AA33H010)

摘　　要：利用4靶非平衡磁控溅射离子镀技术在Si(100)和W6Mo5Cr4V2高速钢基体上沉积类石墨镀层,研究了基体偏压与类石墨镀层的显微硬度、摩擦系数、比磨损率的关系,采用扫描电镜(SEM)和透射电镜(TEM)分析了基体偏压对镀层的表面、断面形貌及微观结构的影响.结果表明:随着基体偏压值的增大,镀层的沉积速率下降,显微硬度和结合强度先增后降,摩擦系数和比磨损率则先降后升.不同偏压对应了不同的显微结构,当基体偏压为-65 V左右,镀层具有良好的力学性能和减摩耐磨性能,对应镀层表面光滑、结构致密,断面呈细纤维结构,镀层由C、Cr和CrCx纳米晶粒组成非晶结构.Graphite-like carbon （GLC） composite coatings were deposited on silicon （100） and W6Mo5Cr4V2 High Speed Steel （HSS） substrate by using four targets unbalanced magnetron sputter ion plating technique. The relation among substrate bias voltage and hardness, friction coefficient, specific wear rate of the coatings were investigated, respectively. Influence of bias voltage on surface and cross-section morphology, microstructure of the coatings were analyzed by SEM and TEM, respectively. As the acceleration of substrates bias voltage and deposition rate of coatings decreased, the micro-hardness and bonding strength increased firstly and then decreased, while friction coefficient and the specific wear rate decreased firstly and then increased. Different bias voltages corresponded to the different microstructure. When bias voltage was-65 V, the coatings presented well friction-reducing, antiwear properties, and they had smooth surface and compact density. Cross-section morphology of the coatings revealed fibrous structure. Furthermore, the coating with amorphous structure was composed of C, Cr and CrCxnanocrystalline.

关 键 词：非平衡磁控溅射 GLC-Cr复合镀层 基体偏压 摩擦磨损性能 显微结构 

分 类 号：TH117.3[机械工程—机械设计及理论] O484.4[理学—固体物理]