氧分压对TiO_2薄膜光学性能的影响  

Influence of Oxygen Pressure on the Optical Properties of TiO_2 Films Deposited with IBS Ion-assisted Technique

作　　者：朱昌[1] 刘佳[1] Dmitriy A. Golsov Sergey M. Zavatskiy 

机构地区：[1]西安工业大学光电工程学院,西安710032 [2]白俄罗斯国立无线电信息大学薄膜实验室,明斯克220013

出　　处：《西安工业大学学报》2008年第6期511-515,共5页Journal of Xi’an Technological University

基　　金：外国专家局人才引进项目(20070006100056)

摘　　要：为得到光学性能良好、稳定的TiO2薄膜,采用离子束溅射的方法,改变氧分压,在k9玻璃上制备出不同结晶取向不同光学常数的TiO2薄膜.采用椭圆偏振光谱仪测试、拟合得到薄膜的厚度、折射率和消光系数.薄膜通过400℃退火,利用X射线衍射仪(XRD)对薄膜的成分、结晶和取向进行分析.实验结果发现,随氧分压增加折射率减低,当氧分压达到1.0×10-2Pa时,折射率在2.43附近,变化趋于稳定.氧分压对薄膜的消光系数k影响较大,氧分压高于1.0×10-2Pa时在可见光和近红外区薄膜消光系数近似为0.随氧分压降低,薄膜从(101)向(200)转变.在此氧分压下,得到的薄膜折射率稳定,消光系数相对较小.A series of titanium dioxide thin films have synthesized on k9 glass wafers by ion beam sputtering（IBS） at different partial pressure of O2. Ellipsometry spectral apparatus is used to analyse the thickness, refractive index and extinction coefficient of the thin film. X-ray diffraction（XRD） is used to analyse the component crystal and orientation. It is found that：The higher is the partial pressure of oxygen, the slower the refractive index is; The refractive index changes in the vicinity of 2. 43 and becomes stability;The extinction coefficient of the thin film is similar to 0 at the near infrared band and visibility field, when the partial pressure of 02 is above 1.0× 10^-2 Pa;After annealing at 400℃, there is anatase in the thin film ,and the preferred orientation of anatase is （101） ;It changes from （101） to （200） with the increase of partial pressure of O2. The TiO2 thin films have the best optical properties.

关 键 词：离子柬溅射 氧化钛薄膜 氧分压 光学性能 

分 类 号：O484.41[理学—固体物理]