Ti掺杂及Ti应力缓和层对类金刚石薄膜附着力的影响  

The effect of Ti-doping and stress relaxation layer on adhesion strength of DLC thin film

作　　者：聂朝胤[1,2] 安藤彰朗 卢春灿[1] 廖兵[1] 

机构地区：[1]西南大学材料科学与工程学院,重庆400715 [2]等离子工学研究所

出　　处：《功能材料》2009年第2期226-229,共4页Journal of Functional Materials

基　　金：重庆市科技攻关计划资助项目(2008AC4017)

摘　　要：研究了Ti掺杂对磁控溅射类金刚石(DLC)薄膜附着力及硬度的影响,同时在Ti掺杂类金刚石(Ti-DLC)薄膜的基础上,通过引入Ti应力缓和层制备了Ti/Ti-DLC/Ti/Ti-DLC……软硬交替多层薄膜,研究了Ti应力缓和层对进一步提高薄膜附着力特性的作用。采用纳米划痕仪和显微硬度计分析测试了薄膜的附着力和硬度。研究表明,金属Ti的掺杂有利于DLC薄膜附着力特性的改善,但对硬度有一定的影响。Ti应力缓和层的导入进一步改善了Ti-DLC薄膜的附着力特性,使其达到或超过了TiN薄膜的水平,对于附着力的改善Ti应力缓和层存在最佳的厚度值。采用特殊的变周期多层结构设计即在应力集中的膜基界面附近采用较小的调制周期,薄膜顶层附近采用较大的调制周期不但可以保持足够的附着力,还可维持Ti-DLC薄膜原有的硬度。The influence of Ti doping on the adhesion strength of diamond-like carbon（DLC） thin films prepared by unbalanced magnetron sputtering was studied. In addition, in order to improve more the adhesion strength of Ti-doping diamond-like earbon（Ti-DLC） thin films, Ti stress relaxation layers were introduced in Ti-DLC thin film and form a Ti/Ti-DLC/Ti/Ti-DLC…… soft and hard alternative multilayer thin film. The adhesion strength of these muhilayer thin films were also studied in this paper. The adhesion strength and hardness of the thin films were measured by nano-scratch tester and microhardness tester. The results showed. Ti doping can improve remarkably the adhesion strength of the DLC thin films, but there is also a relatively strong influence on the hardness. The introduction of Ti stress relaxation layer further improve the adhesion strength of the Ti-DLC thin films, as to reach or exceed the level of TiN thin film. As to the improvement of the adhesion strength, there is an optimum thickness of Ti stress relaxation layer. A special multiple structure with variable period design can increase the adhesion strength and maintain the hardness of the Ti-DLC thin films. That is to apply relatively small modulate period on the surrounding interface here there is a concentrated high stress, and applying large modulate period clear to the top of the thin film.

关 键 词：非平衡磁控溅射 Ti掺杂类金刚石薄膜 Ti应力缓和层 显微硬度 附着力 

分 类 号：O484[理学—固体物理]