X光电子能谱成象分析法  

XPS imaging analysis

作　　者：赵良仲[1] 刘世宏[1] 潘承璜[1] 

机构地区：[1]中国科学院化学研究所,北京100080

出　　处：《分析仪器》1998年第2期57-60,共4页Analytical Instrumentation

基　　金：国家自然科学基金!29675029

摘　　要：简单介绍了三种X光电子能话（XIE）成象分析的原理，包括平行成象法、X射线束扫描法和南电们转板扫描法。结合实际经验，讨论了实验方法。用实例说明了XPS成象法在元素成象和化学态成象中的应用。比较了对石成象与其它成象方法的优缺点。This paper introduces briefly the principles of three kinds of XPS imaging analysis mend, including parallel imag-ing, x-ray beam scanning and static electricity deflection plate scanning. The experimental methods are discussed onthe experience of the authors. Application of XPS imanging in elemental imaging and chemical state imaging are explainedwith examples. The advantages and shortcomings of XPS - and other imaging methods are compared.

关 键 词：X光电子能谱 表面分析 XPS 成象原理 

分 类 号：O657.99[理学—分析化学]