镍钛合金表面锆膜磁控溅射制备与组织结构研究  

Preparation of Zirconium Film on NiTi Shape Memory Alloy Surface by Magnetron Sputtering and Investigation of Its Structure

作　　者：吉宏林[1] 储成林[1] 王如萌[1] 张旭海[1] 张文艳[1] 董寅生[1] 郭超[1] 盛晓波[1] 林萍华[1] 朱剑豪[2] 

机构地区：[1]东南大学,江苏南京211189 [2]香港城市大学,中国香港

出　　处：《稀有金属材料与工程》2009年第2期295-298,共4页Rare Metal Materials and Engineering

基　　金：国家“863”计划项目(2006AA03Z445);教育部新世纪优秀人才支持计划(NCET-06-0464);江苏省自然科学基金(BK2007515)

摘　　要：通过直流平衡磁控溅射法在NiTi形状记忆合金基底上制备纯Zr膜,并采用SEM、XRD、XPS等对Zr膜的组织结构进行研究。结果表明:Zr膜具有晶带T型结构,组织保持细小致密的纤维状特征,没有空洞和锥状形态,表面平整,与基体结合良好;膜和其块体Zr靶材晶体结构一致,出现少量的生物惰性ZrO2陶瓷相。最后,对磁控溅射沉积Zr膜的机制进行了探讨。Pure Zr metal film was deposited on the surface of NiTi shape memory alloy by balanced magnetron DC sputtering and the microstructure of the Zr film was investigated by SEM, XRD and XPS methods. It is found that the Zr film has the T-type crystal band structure with a fine and dense fibre character. There are no pores and prick form. The film has good combination with NiTi substrate and a flatness surface. The crystal structure of the film is identical with its bulk Zr target except for a little bioinert ZrO2 phase. Finally the depositing mechanism of the Zr film by magnetron sputtering is discussed.

关 键 词：NITI形状记忆合金 磁控溅射 ZR 膜 表面改性 

分 类 号：TG139.6[一般工业技术—材料科学与工程]