纯铝材在硫酸中恒流阳极氧化机理初探  

Primary Study of the Mechanism for Constant-Current Anodizing of Aluminum in Sulfuric Acid

作　　者：张胜涛[1] 曹阿林[1] 

机构地区：[1]重庆大学化学化工学院,重庆400030

出　　处：《材料保护》2009年第3期12-14,共3页Materials Protection

摘　　要：为研究铝阳极氧化膜氧化生成机理,采用恒流电解法,对铝试样在硫酸中的阳极氧化过程进行了研究。通过对铝阳极氧化时的阳极氧化电位-时间关系分析发现,阳极氧化电位出现规则的阶跃现象,其阶跃电位为0.0390V,根据其氧化电流密度-时间曲线计算出阳极氧化膜的孔隙率为0.1。结果分析表明,氧化电位阶跃与阻挡层厚度的增加密切相关,氧化电位的阶跃主要是由于阻挡层的增厚引起的,阻挡层首先在孔隙面积上生成,当厚度每增加1.530×10-8cm时,发生铺展作用。The anodic oxidation process of aluminum in sulfuric acid has been investigated at constant current. The mechanism for the for-mation of anodic oxidation coating on Al was primarily studied,and the anodizing potential-time relation of Al was analyzed. Re-sults indicate that the potential -time relation of Al anodizing in sulfuric acid was dominated by regular stepped potential,and the regular stepped potential was measured as 0.039 V. Using anodi-zing current density -time curve,the porosity of the anodizing coating was determined to be about 0.1 %. In general,the regu-lar stepped potential was supposed to be related with the thickness of the barrier layer and it increased with increasing thickness of the barrier layer. Moreover,the barrier layer was first formed in the pores and then spread to other area of Al substrate when the barrier layer thickness increased by 1.53 μm.

关 键 词：纯铝材 阳极氧化 硫酸 恒电流 阻挡层 电位阶跃 机理 

分 类 号：TG174.451[金属学及工艺—金属表面处理]