PIIID技术制备Ti/DLC纳米多层薄膜  

Ti/DLC multilayer synthesized using plasma immersion ion implantation and deposition

作　　者：解志文[1] 王浪平[1] 王小峰[1] 闫久春[1] 黄磊[1] 陆洋[1] 

机构地区：[1]哈尔滨工业大学现代焊接生产技术国家重点实验室,哈尔滨150001

出　　处：《核技术》2009年第3期233-236,共4页Nuclear Techniques

基　　金：国家自然科学基金(50601010;10875033)资助

摘　　要：采用等离子体浸没离子注入与沉积(PIII&D)技术在2Cr13钢表面制备了Ti/DLC纳米多层薄膜,分析了膜层的微观结构和机械特性。实验结果表明:纳米多层膜具有完整、清晰的调制层结构,薄膜的显微硬度均得到明显的提高,硬度较低的膜层具有较好的膜基结合强度和优良的摩擦性能,从综合性能看:纳米多层薄膜保持了类金刚石(DLC)薄膜低摩擦系数的特性,具有良好的承载能力以及膜-基结合特性。Ti/DLC multilayer was synthesized on 2Cr13 substrate using plasma immersion ion implantation and deposition （PIII＆D）. Structure and mechanical performance were characterized. The results showed that the multilayer has a good periodicity. The micro-hardness of the multilayer was improved obviously compared with the single-layer film. The multilayer with relatively low micro-hardness exhibited high adhesion strength and wear resistance. It can be concluded that the multilayer not only maintains the low coefficient characteristic of the single DLC film, but also improves the load bearing capacity and the adhesion strength between the film and substrate.

关 键 词：等离子体浸没离子注入与沉积 结合强度 纳米多层薄膜 

分 类 号：O484.5[理学—固体物理]