脉冲激光扫描淀积类金刚石薄膜  

Pulsed laser scanning deposition of diamondlike thin films

作　　者：王秋良[1] 王又青[1] 安承武[1] 

机构地区：[1]华中理工大学激光技术国家重点实验室

出　　处：《激光技术》1998年第2期77-79,共3页Laser Technology

摘　　要：采用能量密度为１．１７８×１０９Ｗ／ｃｍ２的ＸｅＣｌ准分子激光直接辐照高纯度的石墨靶，并同时采用辅助放电，在１×１０－５Ｔｏｒｒ的真空环境中，于温度为８０℃的Ｓｉ（１００）的基片上淀积出类金刚石薄膜，Ｒａｍａｎ光谱显示在１３３０ｃｍ－１处出现较强的散射峰值；对薄膜红外光谱进行测试，其光谱在２９００ｃｍ－１处有吸收峰，表明所淀积的类金刚石薄膜含有Ｃ－Ｈ键，其Ｈ元素与Ｃ元素的比为４５％。薄膜的电阻率为１．８９×１０６Ω／ｃｍ，通过光吸收测得的该薄膜的能隙为１５５ｅＶ。The diamondlike thin films were prepared by irradiation on high pure graphite with a high energy density(1.178×10 9W/cm 2) laser (XeCl 308nm) in 1×10 5Torr vacuum.The Raman spectra shows the thin film has the properties of diamond,the scatter peak is 1330cm -1 .The IR spectra shows the thin film contained C-H bound,and the ratio of H to C is about 45%.The resistivity and optical energy gap of the thin film are 1.89×10 6Ω/cm and 1.55eV,respectively.

关 键 词：脉冲激光 类金刚石薄膜 RAMAN光谱 激光技术 

分 类 号：TN24[电子电信—物理电子学] O613.71[理学—无机化学]