聚焦离子束系统中图形发生及自动套准系统的研究  

Research of Graphics Generation and Auto-Alignment System for Focused-Ion-Beam

作　　者：张恝恕 杜秉初[1] 陈华[1] 周永健 

机构地区：[1]清华大学电子工程系,北京100084

出　　处：《电子学报》1998年第5期69-71,共3页Acta Electronica Sinica

基　　金：国家863高科技资助

摘　　要：本文描述了一种用于聚焦离子束系统的图形发生器和自动套准系统的研究和实现，并探讨了发展和改进的方向．该系统采用硬件实现扫描控制和坐标变换．在我们的实验条件下，实现了单场扫描2秒钟，套准计算4秒钟．该系统同样也适用于电子束曝光机系统。A graphics generation and auto-alignment system for the focused-ion-beam is described. The development and improvement of the system are also discussed. The feature of the system is using hardware to achieve the scan control and coordinate conversion. Under our experiment condition, scanning one frame takes 2 seconds, an alignment calculation takes 4 seconds. This system is also suitable for the electron beam lithography system.

关 键 词：聚焦离子束 图形发生 自动套准 电子束曝光机 

分 类 号：TN305.7[电子电信—物理电子学]